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Two marks Questions and Answers and Part B Questions
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IEEE Transactions on Nuclear Science
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1. List out the reaction compounds and doping hydrides used in chemical vapour deposition (A.U May 2014) Typical hydrides of the impurity atoms are used as the source of dopant. Typical reaction for arsenic dopant is as below 2AsH3(gas) = 2As[solid] + 3H2 [gas] = 2As (solid) = 2As+ [solid] + 2e Arsine AsH3, Phosphine PH3, Tertiary butyl arsine C4H11As, Tertiary butyl phosphine C4H11P 2. What are the basic processes involved in fabricating ICs using planar technology? (A.U.NOV-2011) • Silicon wafer (substrate) preparation
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